•High repetition frequency, good energy stability
•Compact design and small size
• Internal trigger/external trigger
Features:
•High repetition frequency, good energy stability
•Compact design and small size
• Internal trigger/external trigger
Application: laser deposition of thin films, fine processing, material surface treatment, laser annealing
Specification
technical parameter | |||
Medium gas | ArF | KrF | XeCl |
Wavelength (nm) | 193 | 248 | 308 |
Maximum single pulse energy (mJ) | 100 | 200 | 100 |
Average power (W) | 8 | 18 | 8 |
Maximum repetition frequency (Hz) | 100 | ||
Pulse width (FWHM, ns) | ~15 | ||
Energy stability (sigma %) | 2 | ||
Spot size (mm) (V*H) | 14×5 | ||
Divergence angle (mrad) (V*H) | ~3×1 | ||
Product size (mm) (L*W*H) | 1015×537×582 | ||
Weight (kg) | 100 | ||
Power requirements | 220V, 50Hz, 10A | ||
cooling method | Water cooling | ||
interactive mode | Control system: RS232 (LCD screen/PC) | ||
External trigger: electrical signal |
0755-89217387